RPC | Remote Plasma Clean
RPC for Thin Film Deposition Equipment
Remote Plasma Cleaning Systems
SYSTA engineers, manufactures and supports RPC products for most Thin Film Deposition tools. Our RPC solutions come with professional installation, training, and full warranty.
End users report a reasonably fast ROI:
- Up to 30% increase in throughput
- Clean time reduced 2X - 5X
- Up to 3X increase in interval between PMs
- Cost savings from increased lifetime of chamber parts
- Improved particle performance
- Eliminates 1st wafer 'after clean' thickness variation
RPC is now widely accepted as the leading chamber cleaning BKM by end users and OEMs.
C2F6 chamber cleaning accounts for 50%-70% of the PFCs used in semiconductor fabrication. NF3 RPC reduces global warming emissions by about 95%
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