Photomask Cleaners | Reticle Cleaners
Semi-automated mask cleaners suitable form reticles of all sizes.
Place the reticle on the chuck manually and the recipe driven cleaning and drying processes are completely automated.
Fully equipped solvent compatible spin chamber includes multiple dispense nozzles, front/backside DI rinse, brush scrub and front/backside N2 blow dry.
Chemical Dispense Arm Features:
- DI Water Jet Spray
- DI Water Stream Nozzle
- Surfactant Stream Nozzle
- Resist Cleaning Chemistry Nozzle
Roller style brush scrubber arm
Flat Jet topside N2 blow
Backside DI Rinse & N2 Blow
These systems are based on the standard PicoTrack platform (300 systems in the field)
Brand new tools include installation, start up, training, and warranty.
Optional Chemical Cabinet Available
N2 Blow Off Nozzle
Dispense Arm
DI Water Jet
DI Water Stream
Resist Cleaning Chemistry
Surfactant
Jet Nozzle
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Photomask (Reticle) Spin Cleaning
Semi Automated or Fully Automated
Semitool Seals
Photolithography Spin Tracks
Products:
Single Wafer Spin Cleaner
Mini Coater Developer
Wafer Transfer Equipment
Wet Process Equipment
Manual & SemiAuto Benches
Used Wet Process Equipment
UltraPure Chemicals
Diffusion Furnaces
Remote Plasma Clean
Metal Lift Off Equipment
Custom Automation Services
Reticle Storage
Table Top Wafer Sorters
Wafer Transfer Systems
Single Wafer Vacuum Bake
Photomask Cleaners
Semiconductor O-Rings
CMP Tools & Foundry Services
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